Theory and Application of Laser Chemical Vapor Deposition

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.Mazumder, J. is the author of 'Theory and Application of Laser Chemical Vapor Deposition', published 1995 under ISBN 9780306449369 and ISBN 0306449366.