Atomistic Simulation of Cu/ta Thin Film Deposition & Other Phenomena

Contents include: Introduction, Thin Ta films: growth, stability, and diffusion studied by molecular dynamics simulations, Molecular dynamics study of Cu thin film deposition on B-Ta, Molecular dynamics simulations of Cu/Ta and Ta/Cu thin film growth, The interaction of N with atomically dispersed Ti, V, Cr, Mo, and Ni in ferritic steel, Density functional theory study of alloy element interstitials in Al, Summary.Klaver, Peter is the author of 'Atomistic Simulation of Cu/ta Thin Film Deposition & Other Phenomena ', published 2004 under ISBN 9789040725265 and ISBN 9040725268.