Amorphous and Nanocrystalline Silicon-Based Films--2003: Volume 762

Amorphous silicon technology has been the subject of an MRS Spring Meeting symposium every year since 1984. This remarkable longevity is due to the continuous emergence of new scientific questions and new technological challenges for silicon thin films. In 2003, there is a strong emphasis on methods to achieve high deposition rates using plasma or hot-wire chemical vapor deposition, and on the properties and applications of nanocrystalline silicon films, which for example have been incorporated into stacked a-Si: H/nc-Si: H solar cells. The 120 papers appearing in this volume, from researchers around the world, are sorted under six chapter headings on the basis of subject matter. Chapter I is concerned with amorphous network structures, electronic metastability, defects, and photoluminescence. Chapter II focuses on thin-film transistors and imager arrays. Chapter III covers solar cells. Chapter IV addresses growth mechanisms, hot-filament CVD, and nc-Si: H growth. Chapter V contains all remaining topic in film growth, especially those related to devices. Finally, Chapter VI focuses on crystallized film.Abelson, J. R. is the author of 'Amorphous and Nanocrystalline Silicon-Based Films--2003: Volume 762' with ISBN 9781558996991 and ISBN 1558996990.